Fabrication and Characterization of SiO2-Fe3O4 Using Co-Precipitation Method
DOI:
https://doi.org/10.32734/jotp.v5i1.9887Keywords:
SiO2-Fe3O4, Co-precipitation Method, Morphology, Structure Crystal, Magnetic CharacteristicAbstract
The fabrication of SiO2-Fe3O4 has been successfully carried out using the co-precipitation method. The main materials used are silicon dioxide (SiO2) and natural sand (Fe3O4). The calcination was conducted at 180℃ for 2 hours. The morphology, crystal structure, and magnetic properties were characterized using X-ray diffraction (XRD), scanning electron microscopy (SEM), and vibrating sample magnetometer (VSM). The XRD pattern shows the effect of the material composition on the crystal structure of SiO2-Fe3O4. The grain size of SiO2-Fe3O4 crystals decreases with the increasing composition of silicon. Results of SEM-EDX show that the composition on morphology SiO2-Fe3O4 is a silicon composition. The VSM result shows that sample 3 (composition 7:3) yielded a coercivity value of 114.60 Oe, remanence of 38.62 emu/g, and magnetization saturation of 76.26 emu/g. The distribution of particle size is 70 nm.
Downloads
Published
Issue
Section
Copyright (c) 2023 Journal of Technomaterial Physics
This work is licensed under a Creative Commons Attribution-ShareAlike 4.0 International License.
The Authors submitting a manuscript do so on the understanding that if accepted for publication, copyright of the article shall be assigned to Jurnal Abdimas TALENTA as well as TALENTA Publisher Universitas Sumatera Utara as the publisher of the journal.
Copyright encompasses exclusive rights to reproduce and deliver the article in all forms and media. The reproduction of any part of this journal, its storage in databases and its transmission by any form or media, will be allowed only with written permission from Jurnal Abdimas TALENTA.
The Copyright Transfer Form can be downloaded here.
The copyright form should be signed originally and sent to the Editorial Office in the form of original mail or scanned document.
